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3N4N单质硼颗粒晶体硼颗粒3-5mm用于含硼合金靶材
3N4N晶体硼颗粒3-5mm或5-10mm加入到合金......
Amorphous boron powder B powder from China无定形硼粉厂家
半导体浆料用无定形硼粉为非晶态高纯单质硼微细粉体，相较结晶硼具备更高表面活性。粉末粒度可控、杂质含量低，在浆料体系中分散性优异，不易产生硬团聚。烧结阶段可充当脱氧剂与活性助剂，促进界面结合，同时实现精准硼掺杂调控电学特性。该材料金属杂质管控严格，能够避免半导体器件出现漏电、性能漂移等不良缺陷。
The amorphous boron powder used in semiconductor pastes is amorphous, high-purity, elemental boron microparticles, exhibiting higher surface activity compared to crystalline boron. The powder has controllable particle size, low impurity content, and excellent dispersibility in the paste system, making it less prone to hard agglomeration. During the sintering stage, it can act as a deoxidizer and activator, promoting interfacial bonding and enabling precise boron doping to control electrical properties. Strict control of metallic impurities in this material can prevent defects such as leakage and performance drift in semiconductor devices.
产品参数：
| 化学式 | B |
| CAS号 | 7440-42-8 |
| 比重 | ＜1.73g/cm3 |
| 晶相 | α四方相为主的混合晶型 |
| 结晶度 | 60% |
| 颜色 | 棕色 |
产品型号和成分：
| 牌号 | B95 | B99 | B99.9 | |
| 化学成分 | B | 95-99% | 99-99.9 | ≥99.9 |
| O | ≤2.5% | ＜1% | ＜0.01% | |
| Mg | ≤2.0% | ≤0.1% | ＜0.01% | |
| Fe | ≤0.1% | ＜0.01% | ||
| Mn | ≤0.01% | ＜0.01% | ||
| Al | ≤0.1% | ＜0.01% | ||
| Na | ≤0.1% | ＜0.01% | ||
| Cr | ≤0.01% | ＜0.01% | ||
| Ti | ≤0.01% | ＜0.01% | ||
| Ca | ≤0.1% | ＜0.01% | ||
| S | ≤0.08% | ＜0.01% | ||
| Si | ≤0.08% | ＜0.01% | ||
| 粒度 | 3um | 3um,800nm | 3um | |
产品用途：
- 硼含量95-99%的无定形硼粉，具有较高的质量热和体积热，比冲大，是火箭富燃推进剂和火炸药的优质材料。
- 硼含量99%以上的硼粉，是一种脱氧剂、抗氧剂、催化剂的电子材料，在半导体制备中扮演着重要的角色，它能够影响半导体的导电性能和晶体结构，进而影响元器件的性能和可靠性，长用于电子材料、半导体扩散等对硼的纯度有更高要求的高端产品中。
- 无定型硼粉可用于电池隔膜涂层。通过在电池隔膜上涂覆含无定型硼粉的材料，能够有效提高电池的安全性和稳定性。
- 无定型硼粉是核工业在反应堆中子吸收体的重要材料。
产品包装：
